Using the aerial image measurement technique to speed up mask development for 193nm immersion and polarization lithography

ZIBOLD Axel M.; HARNISCH W.; SCHERUEBL T.; ROSENKRANZ N.; GREIF J.

Art

J-GLOBAL ID：200902230943261412 Reference number：05A0422101

Using the aerial image measurement technique to speed up mask development for 193nm immersion and polarization lithography

空中映像計測技術を使用した193nm液浸および偏光リソグラフィー用マスク開発のスピードアップ

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=05A0422101&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=05A0422101&from=J-GLOBAL&jstjournalNo=D0943A") }}

Author (5)： , , , ,
Material：
Volume： 5645 Page： 223-232 Publication year： 2005
JST Material Number： D0943A ISSN： 0277-786X CODEN： PSISDG Document type： Proceedings
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=05A0422101&from=J-GLOBAL&jstjournalNo=D0943A") }}

Manufacturing technology of solid-state devices

, , , , , , ,

Return to Previous Page