Art
J-GLOBAL ID：200902231675749837   Reference number：06A0745847

光,ラジカル,イオンによるLow-k膜ダメージ(II)

Author (6)：
TAKASHIMA SHIGETAKE

About TAKASHIMA SHIGETAKE

(名古屋大 工)

About 名古屋大 工

, 
UCHIDA SABURO

About UCHIDA SABURO

(名古屋大 工)

About 名古屋大 工

, 
OSHIMA KEIJI

About OSHIMA KEIJI

(ソニー)

About ソニー

, 
NAGAHATA KAZUNORI

About NAGAHATA KAZUNORI

(ソニー)

About ソニー

, 
TATSUMI TETSUYA

About TATSUMI TETSUYA

(ソニー)

About ソニー

, 
HORI MASARU

About HORI MASARU

(名古屋大 工)

About 名古屋大 工


Material：
応用物理学会学術講演会講演予稿集  (Extended Abstracts. Annual Meeting. Japan Society of Applied Physics)

About 応用物理学会学術講演会講演予稿集


Volume： 67th  Issue： 1  Page： 182  Publication year： Aug. 29, 2006 
JST Material Number： Y0055A  Document type： Proceedings
Article type： 短報  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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siloxanes

About siloxanes

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*低誘電率絶縁膜

About 低誘電率絶縁膜


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JST classification (2)：
JST classification
Category name(code) classified by JST.
Applications of plasma 
(BJ02110K)

About Applications of plasma

,  Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
ラジカル

About ラジカル

, 
イオン

About イオン

, 
low-k膜

About low-k膜

, 
ダメージ

About ダメージ


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