Art
J-GLOBAL ID:200902233048138868   Reference number:04A0151008

Control of polytype formation in silicon carbide heteroepitaxial films by pulsed-laser deposition

パルスレーザ蒸着による炭化けい素ヘテロエピタキシャル薄膜におけるポリタイプ形成の制御
Author (3):
Material:
Volume: 84  Issue:Page: 1272-1274  Publication year: Feb. 23, 2004 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=04A0151008&from=J-GLOBAL&jstjournalNo=H0613A") }}
JST classification (1):
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
Terms in the title (4):
Terms in the title
Keywords automatically extracted from the title.

Return to Previous Page