Characteristics of VHF H<sub>2</sub> Plasma Produced at High Pressure

YAMAUCHI Y.; TAKEUCHI Y.; TAKATSUKA H.; YAMASHITA H.; MUTA H.; KAWAI Y.

Art

J-GLOBAL ID：200902233893971145 Reference number：08A0647978

Characteristics of VHF H₂ Plasma Produced at High Pressure

高圧で生成したVHF H₂プラズマの特性

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=08A0647978&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=08A0647978&from=J-GLOBAL&jstjournalNo=H0173A") }}

Author (6)： , , , , ,
Material：
Volume： 48 Issue： 4 Page： 326-330 Publication year： 2008
JST Material Number： H0173A ISSN： 0863-1042 CODEN： BPPHAA Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

, , , , ,

Applications of plasma , Plasma devices

, , ,

Return to Previous Page

Characteristics of VHF H2 Plasma Produced at High Pressure

Characteristics of VHF H₂ Plasma Produced at High Pressure