Art

J-GLOBAL ID：200902235136923144   Reference number：09A0236030

Tribological Properties of Amorphous Boron Nitride Films Prepared by Nanopulse Plasma CVD

ナノパルスプラズマCVDにより生成した非晶質窒化ほう素膜のトライボロジー特性

Author (5)： SAITO Masanori (Tokyo Inst. of Technol., Dept. of Mechanical Sci. and Eng.) ,  SAITO Masanori (JSPS Res. Fellow) ,  YASUHARA Toshiyuki (Tokyo Inst. of Technol., Dept. of Mechanical Sci. and Eng.) ,  MURAKAMI Hiroya (Tokyo Inst. of Technol., Dept. of Mechanical Sci. and Eng.) ,  OHTAKE Naoto (Nagoya Univ., Dept. of Materials, Physics and Energy Eng.)
Material： Journal of Solid Mechanics and Materials Engineering (Web)  (J Solid Mech Mater Eng (Web))
Volume： 3  Issue： 2  Page： 217-226 (J-STAGE)  Publication year： 2009 
JST Material Number： U0026A  ISSN： 1880-9871  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *boron nitride ,  amorphous state ,  *film ,  *tribology ,  *plasma CVD ,  pulse ,  hydroboration ,  borane ,  Ammonia ,  surface roughness ,  thermal stability ,  friction coefficient ,  scratch test
Semi thesaurus term： ナノパルス

JST classification (3)： Ceramic coating to nonmetallic materials  (YC02040K) ,  Lubrication in general  (QB02010S) ,  Applications of plasma  (BJ02110K)

Reference (29)：

• (1) P. B. Mirkarimi, K. F. McCarty, and D. L. Medlin., Review of advances in cubic boron nitride film synthesis, Material Science and Engineering R, Vol. 21, p. 47, 1997.
• (2) G. Poulachon, A. Moisan, and I. S. Jawahir., Tool-wear mechanisms in hard turning with polycrystalline cubic boron nitride tools, Wear, Vol. 250, p. 576, 2001.
• (3) O. Tsuda, K. Watanabe, and T. Taniguchi., Band-edge luminescence at room temperature of boron nitride synthesized by thermal chemical vapor phase deposition, Japanese Journal of Applied Physics, Vol. 46, p. L287, 2007.
• (4) X. L. Peng, Z. H. Barber, and T. W. Clyne., Surface roughness of diamond-like carbon films prepared using various techniques, Surface and Coatings Technology, Vol. 138, p. 23, 2001.
• (5) S. Matsumoto and W. Zhang., High-rate deposition of high-quality, thick cubic boron nitride films by bias-assisted DC jet plasma chemical vapor deposition, Japanese Journal of Applied Physics Part 2, Vol. 39, p. L442, 2000.

Terms in the title (5)： パルス ,  プラズマCVD ,  非晶質 ,  窒化ほう素 ,  トライボロジー特性