Atomic layer deposition of thin hafnium oxide films using a carbon free precursor.

CONLEY J F JR; ONO Y; TWEET D J; ZHUANG W; SOLANKI R

Art

J-GLOBAL ID：200902238544887589 Reference number：03A0076147

Atomic layer deposition of thin hafnium oxide films using a carbon free precursor.

無炭素前駆体を用いた薄い酸化ハフニウム膜の原子層蒸着

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Author (5)： , , , ,
Material：
Volume： 93 Issue： 1 Page： 712-718 Publication year： Jan. 01, 2003
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Oxide thin films , Dielectrics in general

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