Synthesis and characterization of fluorinated amorphous carbon films by reactive magnetron sputtering

ISHIHARA M.; SUZUKI M.; WATANABE T.; NAKAMURA T.; TANAKA A.; KOGA Y.

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J-GLOBAL ID：200902242553315455 Reference number：05A0542185

Synthesis and characterization of fluorinated amorphous carbon films by reactive magnetron sputtering

反応性マグネトロンスパッタリングによるふっ素化非晶質炭素膜の合成とキャラクタリゼーション

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Volume： 14 Issue： 3/7 Page： 989-993 Publication year： Mar. 2005
JST Material Number： W0498A ISSN： 0925-9635 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Semiconductor thin films

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