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J-GLOBAL ID：200902242899385700
Reference number：03A0692731
Structural Control of Silicon Oxide Particles by Oxygen Partial Pressure in RF Plasma
RFプラズマ中の酸素分圧による酸化けい素粒子の構造制御
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Author (6)：
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Material：
Volume：
42
Issue：
9A
Page：
5896-5897
Publication year：
Sep. 15, 2003
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
短報
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (2)：
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Oxide thin films
, Reaction due to charged particle bombardment and electric discharge
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Reference (7)：
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1) T. Mori, K. Tanaka, T. Inomata, A. Takeda and M. Kogoma: Thin Solid Films 316 (1998) 89.
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2) T. Sato, Y. Saito and C. Kaito: to be published in Surf. Rev. Lett. (2003).
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3) T. Morioka, S. Kimura, N. Tsuda, C. Kaito, Y. Saito and C. Koike: Mon. Not. R. Astron. Soc. 299 (1998) 78.
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4) T. Morioka, S. Kimura, N. Tsuda, C. Kaito, Y. Saito and C. Koike: Antarct. Meteorite Res. 10 (1997) 449.
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5) N. Suzuki, S. Kimura, T. Nakada, C. Kaito, Y. Saito and C. Koike: Meteoritics Planetary Sci. 35 (2000) 1269.
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