Structural Control of Silicon Oxide Particles by Oxygen Partial Pressure in RF Plasma

SATO T; TAKEDA A; KIMURA Y; SUZUKI H; SAITO Y; KAITO C

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J-GLOBAL ID：200902242899385700 Reference number：03A0692731

Structural Control of Silicon Oxide Particles by Oxygen Partial Pressure in RF Plasma

RFプラズマ中の酸素分圧による酸化けい素粒子の構造制御

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Author (6)： , , , , ,
Material：
Volume： 42 Issue： 9A Page： 5896-5897 Publication year： Sep. 15, 2003
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：短報 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Oxide thin films , Reaction due to charged particle bombardment and electric discharge

Reference (7)：

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2) T. Sato, Y. Saito and C. Kaito: to be published in Surf. Rev. Lett. (2003).
3) T. Morioka, S. Kimura, N. Tsuda, C. Kaito, Y. Saito and C. Koike: Mon. Not. R. Astron. Soc. 299 (1998) 78.
4) T. Morioka, S. Kimura, N. Tsuda, C. Kaito, Y. Saito and C. Koike: Antarct. Meteorite Res. 10 (1997) 449.
5) N. Suzuki, S. Kimura, T. Nakada, C. Kaito, Y. Saito and C. Koike: Meteoritics Planetary Sci. 35 (2000) 1269.

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