Effect of nitridation on polarity, microstructure, and morphology of AlN films

WU Y; HANLON A; KAEDING J F; SHARMA R; FINI P T; NAKAMURA S; SPECK J S

Art

J-GLOBAL ID：200902243473528233 Reference number：04A0120691

Effect of nitridation on polarity, microstructure, and morphology of AlN films

AlN膜の極性,ミクロ構造と形態に及ぼす窒化の効果

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Material：
Volume： 84 Issue： 6 Page： 912-914 Publication year： Feb. 09, 2004
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Semiconductor thin films , Lattice defects in semiconductors

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