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J-GLOBAL ID：200902246075869496   Reference number：03A0836895

Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization

低誘電率から極低誘電率のSiCOH膜の構造 Fourier変換赤外分光による特性評価
Author (2)：
GRILL A

About GRILL A

(IBM T.J. Watson Res. Center, New York)

About IBM T.J. Watson Res. Center, New York

, 
NEUMAYER D A

About NEUMAYER D A

(IBM T.J. Watson Res. Center, New York)

About IBM T.J. Watson Res. Center, New York


Material：
Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)

About Journal of Applied Physics


Volume： 94  Issue： 10  Page： 6697-6707  Publication year： Nov. 15, 2003 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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*permittivity

About permittivity

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
crosslinking

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JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

,  Dielectrics in general 
(BM05010F)

About Dielectrics in general

Substance index (1)：
Substance index
Chemical Substance indexed to the Article.
Tetramethylcyclotetrasiloxane

About Tetramethylcyclotetrasiloxane

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
低誘電率

About 低誘電率

, 
Fourier変換赤外分光

About Fourier変換赤外分光

, 
特性評価

About 特性評価


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