Nonvolatile hydrogenated-amorphous-silicon thin-film-transistor memory devices

KUO Yue; NOMINANDA Helinda

Art

J-GLOBAL ID：200902253949046785 Reference number：06A0895485

Nonvolatile hydrogenated-amorphous-silicon thin-film-transistor memory devices

不揮発性水素化非晶質シリコン薄膜トランジスタメモリ素子

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Author (2)： ,
Material：
Volume： 89 Issue： 17 Page： 173503-173503-3 Publication year： Oct. 23, 2006
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Semiconductor integrated circuit , Transistors , Semiconductor thin films , Thin films of other inorganic compounds

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