Art
J-GLOBAL ID：200902255211720751   Reference number：03A0659917

MOCVD法によるHf0.8Al0.2Oy成膜速度の影響

Author (4)：
YAMAGUCHI MASAOMI

About YAMAGUCHI MASAOMI

(富士通研)

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, 
SAKODA TSUNEHISA

About SAKODA TSUNEHISA

(富士通研)

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, 
MINAKATA HIROSHI

About MINAKATA HIROSHI

(富士通研)

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, 
SUGIYAMA YOSHIHIRO

About SUGIYAMA YOSHIHIRO

(富士通研)

About 富士通研


Material：
応用物理学会学術講演会講演予稿集  (Extended Abstracts. Annual Meeting. Japan Society of Applied Physics)

About 応用物理学会学術講演会講演予稿集


Volume： 64th  Issue： 2  Page： 715  Publication year： Aug. 30, 2003 
JST Material Number： Y0055A  Document type： Proceedings
Article type： 短報  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*dielectric thin film

About dielectric thin film

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

,  Techniques and equipment of thin film deposition 
(BK14020I)

About Techniques and equipment of thin film deposition

Terms in the title (2)：
Terms in the title
Keywords automatically extracted from the title.
MOCVD

About MOCVD

, 
成膜速度

About 成膜速度


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