Art
J-GLOBAL ID:200902256576093477   Reference number:06A0844085

Crystal Growth Technology of Fluoride and Oxide Developed from the Viewpoint of Their Material and Functional Properties Fabrication and Structure Control of Metal Oxide Thin Films by Liquid Phase Deposition Method as Soft Solution Process

材料物性から見たフッ化物・酸化物単結晶の育成技術 液相析出法(Liquid Phase Deposition;LPD法)による水溶液からの機能性酸化物の調製と形状規制
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Material:
Volume: 33  Issue:Page: 162-168  Publication year: Sep. 30, 2006 
JST Material Number: F0452B  ISSN: 0385-6275  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Category name(code) classified by JST.
Oxide thin films 
Reference (38):
  • 1) BOCKSTALLER M. R. Adv. Mater.. (2005) vol.17, p.1331.
  • 2) OZIN G. A. Chem. Comm. (2000) vol.419,
  • 3) ティー アイ シー編集部編. セラミックス薄膜の原子 分子レベル制御技術とデバイス. ティー アイ シー. (2000)
  • 4) 出来成人. フッ素化学入門-先端テクノロジーに果すフッ素化学の役割. (2004) vol.149,
  • 5) DEKI S. Chem. Lett.. (1996) vol.433,
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