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J-GLOBAL ID:200902258261481579   Reference number:04A0447889

Simultaneous Formation of Multiwall Carbon Nanotubes and their End-Bonded Ohmic Contacts to Ti Electrodes for Future ULSI Interconnects

将来の超LSI相互接続に対する,多層カーボンナノチューブならびに「Ti電極との端部結合Ohm接触」の同時形成
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Volume: 43  Issue: 4B  Page: 1856-1859  Publication year: Apr. 30, 2004 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Atomic and molecular clusters  ,  Semiconductor-metal contacts 
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