Art

J-GLOBAL ID：200902259718243268   Reference number：08A1222627

Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems

MCC投影システムのスループットを改善するための文字投影マスク集合の最適化

Author (3)： SUGIHARA Makoto (Toyohashi Univ. Technol., Toyohashi-shi, JPN) ,  MATSUNAGA Yusuke (Kyushu Univ., Fukuoka-shi, JPN) ,  MURAKAMI Kazuaki (Kyushu Univ., Fukuoka-shi, JPN)
Material： IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences (Institute of Electronics, Information and Communication Engineers)  (IEICE Trans Fundam Electron Commun Comput Sci (Inst Electron Inf Commun Eng))
Volume： E91-A  Issue： 12  Page： 3451-3460  Publication year： Dec. 01, 2008 
JST Material Number： F0699C  ISSN： 0916-8508  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： irradiation ,  integrated circuit ,  photomask ,  throughput ,  cell structure ,  optimization problem ,  integer linear programming ,  nonlinear programming ,  analytical model ,  pattern formation ,  letter ,  CPU time ,  experiment ,  CAD ,  *lithography ,  electron beam ,  parallel processing
Semi thesaurus term： *maskless lithography ,  evaluation experiment

JST classification (2)： CAD,CAM  (JE10000A) ,  Manufacturing technology of solid-state devices  (NC03030V)

Reference (22)：

• CZYZYK, J. The NEOS server. IEEE J. Computational Science and Engineering. 1998, 5, 3, 68-75
• HATTORI, K. Electron-beam direct writing system EX-8D employing character projection exposure method. J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct. 1993, 11, 6, 2346-2351
• ILOG Inc. CPLEX 10.2 User's Manual. 2007
• FUJINO, T. Character-build standard-cell layout technique for high-throughput character-projection EB lithography. Proc. SPIE, Photomask and Next-Generation Lithography Mask Technology XII, Yokohama, Japan, April 2005. 2005, 5853, 160-167
• KAJIYA, Y. Shot number estimation for EB direct writing for logic LSI utilizing character-build standard-cell layout technique. Proc. SPIE, Photomask and Next-Generation Lithography Mask Technology XIII, Yokohama, Japan, April 2006. 2006, 6283

Terms in the title (7)： MCC ,  投影 ,  スループット ,  文字 ,  マスク ,  集合 ,  最適化