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J-GLOBAL ID：200902263969365041   Reference number：06A0578416

An advanced study for defect disposition through 193nm aerial imaging

193nm空間像を通した欠陥配置の先端的研究
Author (3)：
DUERR Arndt C.

About DUERR Arndt C.

(Advanced Mask Technol. Center (AMTC), Dresden, DEU)

About Advanced Mask Technol. Center (AMTC), Dresden, DEU

, 
ZIBOLD Axel M.

About ZIBOLD Axel M.

(Carl Zeiss SMS GmbH, Jena, DEU)

About Carl Zeiss SMS GmbH, Jena, DEU

, 
BOEHM Klaus

About BOEHM Klaus

(Carl Zeiss SMS GmbH, Jena, DEU)

About Carl Zeiss SMS GmbH, Jena, DEU


Material：
Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)

About Proceedings of SPIE


Volume： 6152  Issue： Pt.2  Page： 61522M.1-61522M.9  Publication year： 2006 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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reproducibility

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,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*空間像

About 空間像

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
空間像

About 空間像

, 
欠陥

About 欠陥

, 
研究

About 研究


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