Art
J-GLOBAL ID:200902271209474510
Reference number:04A0806219
Technological Breakthroughs in Growth Control of Silicon Carbide for High Power Electronic Devices
ハイパワー電子素子用のシリコンカーバイドの成長制御における技術的ブレークスルー
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Author (1):
Material:
Volume:
43
Issue:
10
Page:
6835-6847
Publication year:
Oct. 15, 2004
JST Material Number:
G0520B
ISSN:
0021-4922
Document type:
Article
Article type:
文献レビュー
Country of issue:
Japan (JPN)
Language:
ENGLISH (EN)
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JST classification (1):
JST classification
Category name(code) classified by JST.
Semiconductor thin films
Reference (106):
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1) Yu. M. Tairov and V. F. Tsvetkov: J. Cryst. Growth 43 (1978) 209.
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2) N. Kuroda, K. Shibahara, W. S. Yoo, S. Nishino and H. Matsunami: Ext. Abstr. 34th Spring Meeting of Japan Society Applied Physics and Related Societies, Tokyo, 1987, p. 135 [in Japanese].
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3) N. Kuroda, K. Shibahara, W. S. Yoo, S. Nishino and H. Matsunami: Ext. Abstr. 19th Conf. on Solid State Devices and Materials, Tokyo, 1987, p. 227.
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4) A. R. Verma and P. Krishna: <I>Polymorphysm and Polytypism in Crystals</I> (John Wiley & Sons, New York, 1966).
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5) V. J. Jennings, A. Sommer and H. Chang: J. Electrochem. Soc. 113 (1966) 728.
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