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J-GLOBAL ID:200902271209474510   Reference number:04A0806219

Technological Breakthroughs in Growth Control of Silicon Carbide for High Power Electronic Devices

ハイパワー電子素子用のシリコンカーバイドの成長制御における技術的ブレークスルー
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Volume: 43  Issue: 10  Page: 6835-6847  Publication year: Oct. 15, 2004 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 文献レビュー  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semiconductor thin films 
Reference (106):
  • 1) Yu. M. Tairov and V. F. Tsvetkov: J. Cryst. Growth 43 (1978) 209.
  • 2) N. Kuroda, K. Shibahara, W. S. Yoo, S. Nishino and H. Matsunami: Ext. Abstr. 34th Spring Meeting of Japan Society Applied Physics and Related Societies, Tokyo, 1987, p. 135 [in Japanese].
  • 3) N. Kuroda, K. Shibahara, W. S. Yoo, S. Nishino and H. Matsunami: Ext. Abstr. 19th Conf. on Solid State Devices and Materials, Tokyo, 1987, p. 227.
  • 4) A. R. Verma and P. Krishna: <I>Polymorphysm and Polytypism in Crystals</I> (John Wiley & Sons, New York, 1966).
  • 5) V. J. Jennings, A. Sommer and H. Chang: J. Electrochem. Soc. 113 (1966) 728.
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