Art
J-GLOBAL ID：200902276995507487   Reference number：07A0889599

Kinetics and Mechanism of the Organic Degradation in Aqueous Solution Irradiated with Gaseous Plasma

気体プラズマを用いて照射した水溶液中の有機分解の反応速度と機構
Author (2)：
TOMIZAWA Shunsuke

About TOMIZAWA Shunsuke

(Saitama Inst. of Technol., Saitama, JPN)

About Saitama Inst. of Technol., Saitama, JPN

, 
TEZUKA Meguru

About TEZUKA Meguru

(Saitama Inst. of Technol., Saitama, JPN)

About Saitama Inst. of Technol., Saitama, JPN


Material：
Plasma Chemistry and Plasma Processing  (Plasma Chem Plasma Process)

About Plasma Chemistry and Plasma Processing


Volume： 27  Issue： 4  Page： 486-495  Publication year： Aug. 2007 
JST Material Number： H0836A  ISSN： 0272-4324  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
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*organic compound

About organic compound

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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anodic oxidation

About anodic oxidation

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxidation,reduction 
(CF02060T)

About Oxidation,reduction

,  Gas discharges 
(BJ03020T)

About Gas discharges

Substance index (1)：
Substance index
Chemical Substance indexed to the Article.
Phenol

About Phenol

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
気体

About 気体

, 
プラズマ

About プラズマ

, 
水溶液

About 水溶液

, 
有機分解

About 有機分解

, 
反応速度

About 反応速度


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