Effects of Protecting Group on Resist Characteristics of Acryl Polymers for 193 nm Lithography

OGATA T; MATSUMARU S; SHIMIZU H; KUBOTA N; HADA H; SHIRAI M

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J-GLOBAL ID：200902282060081880 Reference number：04A0512700

Effects of Protecting Group on Resist Characteristics of Acryl Polymers for 193 nm Lithography

193nmリソグラフィー用のアクリル重合体のレジスト特性に及ぼす保護基の影響

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Material：
Volume： 17 Issue： 4 Page： 483-488 Publication year： 2004
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Copolymerization , Aliphatic carboxylic esters,anhydrides,acid halides,acyl peroxides , Manufacturing technology of solid-state devices

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