Art
J-GLOBAL ID:200902282836030939   Reference number:06A0630702

Vacancy-impurity complexes in polycrystalline Si used as gate electrodes of HfSiON-based metal-oxide-semiconductors probed using monoenergetic positron beams

単一エネルギーの陽電子ビームを用いて調べた,HfSiON系金属-酸化物-半導体のゲート電極として使われる多結晶Si中の空孔-不純物複合体
Author (10):
Material:
Volume: 100  Issue:Page: 034509-034509-6  Publication year: Aug. 01, 2006 
JST Material Number: C0266A  ISSN: 0021-8979  CODEN: JAPIAU  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=06A0630702&from=J-GLOBAL&jstjournalNo=C0266A") }}
JST classification (2):
JST classification
Category name(code) classified by JST.
Lattice defects in semiconductors  ,  Metal-insulator-semiconductor structures 

Return to Previous Page