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J-GLOBAL ID：200902282865131736
Reference number：05A0074320
Measurements of Minute Lattice Distortions in Silicon Crystals by X-Ray Double-Crystal Topography Using Extremely Asymmetric Reflection
極端に非対称な反射を用いたX線2結晶トポグラフィーによるシリコン結晶中の微小格子変形の測定
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Author (3)：
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Material：
Volume：
43
Issue：
12
Page：
8331-8334
Publication year：
Dec. 15, 2004
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Surface structure of semiconductors
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