Art

J-GLOBAL ID：200902285471023244   Reference number：08A0729219

Optimum Adjustment for Distortion in Semiconductor Lithography Equipment

半導体リソグラフィー装置の歪調整の最適化

Author (3)： FUKAGAWA Youzou (CANON INC. Utsunomiya Optical Products Operations) ,  SHINANO Yuji (Tokyo Univ. of Agriculture and Technol.) ,  NAKAMORI Mario (Tokyo Univ. of Agriculture and Technol.)
Material： Journal of Advanced Mechanical Design, Systems, and Manufacturing (Web)  (J Adv Mech Des Syst Manuf (Web))
Volume： 2  Issue： 3  Page： 378-384 (J-STAGE)  Publication year： 2008 
JST Material Number： U0027A  ISSN： 1881-3054  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： semiconductor process ,  *lithography ,  *lens(optics) ,  *distortion correction ,  optimization ,  optimum design ,  parameter estimation ,  linear programming ,  exact solution

JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Reference (6)：

• (1) Flack, W. W., et al., Efficient overlay optimization of stepper correctables, Metrology, Inspection, and Process Control for Microlithography X Proceedings, SPIE 2725, 5 (1996), pp. 400-413
• (2) Aoki, A., Method for Correcting Alignment Error in Aligner and Aligner Using it, JP10-022190, Patent journal, (1998)
• (3) Ignizio, J. P., Linear Programming in Single- & Multiple-Objective Systems, Prentice-Hall Inc., (1982)
• (4) Mori, M., and Matsui, T., Operations Research, Management system engineering library 8, Asakura-Shoten, (2004), pp. 78-79, (in Japanese)
• (5) Konno, H., Linear Programming, JUSE Press. Ltd., (1987), (in Japanese)

Terms in the title (3)： 半導体リソグラフィー ,  歪 ,  最適化