Art
J-GLOBAL ID：200902286661081573
Reference number：04A0543829
Deposition of Cu and Ru Thin Films in Deep Nanotrenches/Holes Using Supercritical Carbon Dioxide
超臨界二酸化炭素を用いた深いナノトレンチ/ホール中へのCu及びRu薄膜の堆積
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Author (1)：
Material：
Volume：
43
Issue：
6B
Page：
3928-3933
Publication year：
Jun. 30, 2004
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Metallic thin films
Terms in the title (7)：
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