Fabrication of YSZ Thin Films by Chemical Vapor Infiltration Using NiO as Oxygen Source

KIKUCHI K; OKAYA T; HIROSE W; MATSUO K; MINESHIGE A; OGUMI Z

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J-GLOBAL ID：200902288392864305 Reference number：03A0707957

Fabrication of YSZ Thin Films by Chemical Vapor Infiltration Using NiO as Oxygen Source

NiOを酸素源として用いる化学蒸気浸透法によるYSZ薄膜の作製

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Author (6)： , , , , ,
Material：
Volume： 150 Issue： 10 Page： C688-C692 Publication year： Oct. 2003
JST Material Number： C0285A ISSN： 1945-7111 CODEN： JESOAN Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Oxide thin films , Bases,metal oxides

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