Art
J-GLOBAL ID：200902292725905826   Reference number：03A0745520

Decomposition of interfacial SiO2 during HfO2 deposition

HfO2の堆積時における界面SiO2の分解
Author (2)：
COPEL M

About COPEL M

(IBM Res. Div., New York)

About IBM Res. Div., New York

, 
REUTER M C

About REUTER M C

(IBM Res. Div., New York)

About IBM Res. Div., New York


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 83  Issue： 16  Page： 3398-3400  Publication year： Oct. 20, 2003 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
hafnium oxide

About hafnium oxide

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

,  Other noncatalytic reactions 
(CB06070U)

About Other noncatalytic reactions

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
HfO2

About HfO2

, 
界面

About 界面

, 
SiO2

About SiO2

, 
分解

About 分解


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