Art

J-GLOBAL ID：200902296628121140   Reference number：05A0218207

A Simple Method for Fabrication of Mesoporous Films Using a Rapid Heating Process

急速加熱法を用いるメソポーラスフィルムの簡便製造法

Author (6)： YAMADA T (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Tsukuba) ,  ZHOU H (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Tsukuba) ,  HONMA I (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Tsukuba) ,  UENO Y (NTT Microsystem Integration Lab., Atsugi) ,  HORIUCHI T (NTT Microsystem Integration Lab., Atsugi) ,  NIWA O (NTT Microsystem Integration Lab., Atsugi)
Material： Chemistry Letters  (Chem Lett)
Volume： 34  Issue： 3  Page： 328-329  Publication year： Mar. 05, 2005 
JST Material Number： S0742A  ISSN： 0366-7022  CODEN： CMLTAG  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *porosity (property) ,...
Semi thesaurus term： *silica

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JST classification (2)： Nonmetallic compounds  (CD01070R) ,  Thin films of other inorganic compounds  (BK14060A)

Reference (20)：

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•  J. S. Beck, J. C. Vartuli, W. J. Roth, M. E. Leonowicz, C. T. Kresge, K. D. Schmitt, C. T.-W. Chu, D. H. Olson, E. W. Sheppard, S. B. McCullen, J. B. Higgins, and J. L. Schlenker, J. Am. Chem. Soc., 114, 10834 (1992).
• 2) D. Zhao, Q. Huo, J. Feng, B. F. Chmelka, and G. D. Stucky, J. Am. Chem. Soc., 120, 6024 (1998).
• 3) H. S. Zhou, T. Yamada, K. Asai, I. Honma, H. Uchida, and T. Katsube, Jpn. J. Appl. Phys., 40, 7098 (2001);
•  Y. Brian, H. S. Zhou, T. Yamada, K. Asai, and I. Honma, ChemPhysChem, 5, 261 (2004);

Terms in the title (3)： 急速加熱 ,  簡便 ,  製造法