Proj
J-GLOBAL ID:200904043867779663  Research Project code:9800016713 Update date:Dec. 18, 1996

Deposition of ferroelectric films by sputtering method

スパッタリング法による強誘電体膜の形成
Study period:1992 - 0
Organization (1):
Investigating Researcher (1):
Research overview:
We try to deposit ferroelectric film from various material as target in sputtering process. We investigate the epitaxy of deposited film.
Keywords (4):
sputtered ,  ferroelectrics ,  thin ,  crystal
Research program: Ordinary Research

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