J-GLOBAL ID:200904044640374698  Research Project code:9800033032 Update date:Dec. 15, 2003

Functional thin film deposition by plasma CVD

Study period:1995 - 1997
Organization (1):
Investigating Researcher (2):
Research overview:
It is learnt through the thin film formation by plasma CVD that the thin film characteristics largely change depending on the film formation conditions. This study proceeds to review, as the original material, a substance containing carbon, hydrogen, oxygen, silicon, etc., and to change the film formation mechanism, aiming at developing a thin film as the new material with a novel function.
Keywords (4):
plasma ,  thin ,  thin ,  functional
Research program: Ordinary Research
Research budget: 1995: \0

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