Research Project code：9800033032
Update date：Dec. 15, 2003
Functional thin film deposition by plasma CVD
1995 - 1997
Investigating Researcher (2)：
It is learnt through the thin film formation by plasma CVD that the thin film characteristics largely change depending on the film formation conditions. This study proceeds to review, as the original material, a substance containing carbon, hydrogen, oxygen, silicon, etc., and to change the film formation mechanism, aiming at developing a thin film as the new material with a novel function.
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