Proj
J-GLOBAL ID:200904045116897671  Research Project code:9800003629 Update date:Feb. 27, 2003

Application of focused ion-beam technology

集束イオンビーム技術とその応用
Study period:1984 - 0
Organization (1):
Investigating Researcher (2):
Research overview:
1) Fabrication of new electronic materials by focused ion-beam implantation. 2) Fabrication of semiconductor quantum nanostructures by ion -beam lithography.
Keywords (7):
ion ,  micro ,  functional ,  lithography ,  ion ,  beam ,  ion
Research program: Special Research and Development
Research budget: 1994: \15,500,000

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