Research Project code：9800021180
Update date：Dec. 15, 2003
Basic research on thin film devices prepared by ion and plasma processing technology
1993 - 1995
Investigating Researcher (9)：
In order to make an small, sensitive and precise electronic device, the damage free thin films and etching technology are essential factors. Ion and plasma processing technology are excellent for etching process, but some problems may occur for the damage free thin film fabrication. Thin film deposition, etching and device fabrication technology using low energy ion processing technology will be studied. This project includes 3 themes. 1) ITO thin film prepared by low energy ion assisted IBS. 2) Development of CMOS IC technology using ion process. 3) Development of Infrared sensor by Y-system high Tc superconductor thin films.
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