Proj
J-GLOBAL ID:200904094820231663  Research Project code:9800022312 Update date:Dec. 10, 2004

Hetero-epitaxy on patterned substrates

溝付き基板上へのヘテロエピタクシー
Study period:1992 - 1997
Organization (1):
Investigating Researcher (3):
Research overview:
III-V alloy thin layers are grown on the patterned substrate by the liquid phase epitaxy method and the hot wall method. Lattice relaxation mechanism is investigated. The optimum pattern structure to reduce misfit dislocations is studied experimentally and numerically.
Keywords (8):
groove ,  substrate(plate) ,  solid ,  metallic ,  liquid ,  numerical ,  mismatch ,  vapor
Research program: Ordinary Research
Research budget: 1997: \500,000

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