Proj
J-GLOBAL ID：200904094820231663
Research Project code：9800022312
Update date：Dec. 10, 2004
Hetero-epitaxy on patterned substrates
溝付き基板上へのヘテロエピタクシー
Study period：1992 - 1997
Organization (1)：
Investigating Researcher (3)：
,
,
Research overview：
III-V alloy thin layers are grown on the patterned substrate by the liquid phase epitaxy method and the hot wall method. Lattice relaxation mechanism is investigated. The optimum pattern structure to reduce misfit dislocations is studied experimentally and numerically.
Keywords (8)：
groove
, substrate(plate)
, solid
, metallic
, liquid
, numerical
, mismatch
, vapor
Ordinary Research
Research budget：
1997: \500,000
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