Mat
J-GLOBAL ID：200909038233680235   JST material number (FULL)：L0202AAN   JST material number：L0202A

Journal of Photopolymer Science and Technology

JST material number：
JST material number
Identifier of Material (journals)
L0202A
ISSN (2)： 0914-9244 ,  1349-6336
CODEN (1)： JSTEEW
Material type：Article, Meta and Print, 6a
Publication frequency： 6a
Country of issued：Japan(JPN)
Language (1)： English(EN)
JST classification  (1)： 高分子化学 (CG)
Publisher： フォトポリマー学会 ,  フォトポリマー懇話会
Publication place：千葉
Conference name  (5)：
  • International Symposium on Materials & Processes for 0.25um Lithography, Tokyo, 19920623 - 19920626
  • Symposium on Photochemistry in Solid Polymers, Tokyo, 19910620 - 19910621
  • International Symposium on Materials for Excimer Laser Lithography, Tokyo, 19910619 - 19910620
  • International Symposium on Chemical Amplification Resists for Microlithography, Tokyo, 19900620 - 19900621
  • Symposium on the Reaction Mechanism and Recent Developments of the Ortho-Diazomaphotoresist, Tokyo, 19890622 -
Previous material name  (1)：
  • フォトポリマー・コンファレンス講演要旨集
Website： https://www.jstage.jst.go.jp/browse/photopolymer/-char/ja/
JST library information (0) ※：

※Subject to change. Contact us for the latest status.


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