Rchr
J-GLOBAL ID:201001063938165263   Update date: Apr. 03, 2024

Yatabe Zenji

ヤタベ ゼンジ | Yatabe Zenji
Affiliation and department:
Job title: Associate Professor
Homepage URL  (1): https://researchmap.jp/zenji.yatabe/link
Research field  (4): Thin-film surfaces and interfaces ,  Electronic devices and equipment ,  Semiconductors, optical and atomic physics ,  Bio-, chemical, and soft-matter physics
Research keywords  (3): Compound semiconductors ,  Surfaces and interfaces ,  Fluctuations
Research theme for competitive and other funds  (11):
  • 2023 - 2026 Gate insulator deposition process for GaN-based MOS devices using mist-CVD technique
  • 2023 - 2026 Study on high-κ dielectric/regrown nitride semiconductor interfaces for high efficiency and highly-safe transistors
  • 2019 - 2022 Integral transformation method to investigate flow characteristics of polymer solution from the phase transition perspective
  • 2019 - 2022 Surface passivation and insulated gate structures for nitride-based semiconductor devices using mist-CVD method
  • 2015 - 2018 Characterization and control of insulator/AlGaN interface for power device application
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Papers (43):
  • Ali Baratov, Shinsaku Kawabata, Shun Urano, Itsuki Nagase, Masaki Ishiguro, Shogo Maeda, Takahiro Igarashi, Toi Nezu, Zenji Yatabe, Maciej Matys, et al. Evidence of reduced interface states in Al2O3/AlGaN MIS structures via insertion of ex-situ regrown AlGaN layer. Applied Physics Express. 2022. 15. 10. 104002-1-5
  • Zenji Yatabe, Joel T. Asubar. Ornstein-Uhlenbeck process in a human body weight fluctuation. Physica A: Statistical Mechanics and its Applications. 2021. 582. 126286-1-6
  • Joel T. Asubar, Zenji Yatabe, Dagmar Gregusova, Tamotsu Hashizume. Controlling surface/interface states in GaN-based transistors: Surface model, insulated gate, and surface passivation. Journal of Applied Physics. 2021. 129. 12. 121102-1-28
  • Rui Shan Low, Joel T. Asubar, Ali Baratov, Shunsuke Kamiya, Itsuki Nagase, Shun Urano, Shinsaku Kawabata, Hirokuni Tokuda, Masaaki Kuzuhara, Yusui Nakamura, et al. GaN-based MIS-HEMTs with Al2O3 dielectric deposited by low-cost and environmental-friendly mist-CVD technique. Applied Physics Express. 2021. 14. 3. 031004-1-5
  • Ruri Hidema, Zenji Yatabe, Hikari Takahashi, Ryusei Higashikawa, Hiroshi Suzuki. Inverse integral transformation method to derive local viscosity distribution measured by optical tweezers. Soft Matter. 2020. 16. 29. 6826-6833
more...
MISC (31):
  • Zenji Yatabe, Yusui Nakamura, Joel T. Asubar. Mist chemical vapor deposited-gate insulators for GaN-based MIS devices applications. 2022 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK). 2022. 1-3
  • Tomohiro Motoyama, Zenji Yatabe, Yusui Nakamura, Ali Baratov, Rui Shan Low, Shun Urano, Joel T. Asubar, Masaaki Kuzuhara. Mist chemical vapor deposited-Al2O3/AlGaN interfacial characterization for GaN MIS-HEMTs. 2021 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK). 2021. 1-2
  • M. Ishiguro, S. Urano, R. S. Low, M. Faris, I. Nagase, A. Baratov, J. T. Asubar, T. Motoyama, Y. Nakamura, Z. Yatabe, et al. Recessed gate GaN-based MIS-HEMTs with Al2O3 gate dielectric deposited by mist-CVD method. 2021 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK). 2021. 1-2
  • S. Urano, R. S. Low, M. Faris, M. Ishiguro, I. Nagase, A. Baratov, J. T. Asubar, T. Motoyama, Y. Nakamura, Z. Yatabe, et al. Electrical properties of GaN-based MIS-HEMTs with Al2O3 gate insulator deposited by ALD and mist-CVD techniques. 2021 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK). 2021. 1-2
  • Rui Shan Low, Itsuki Nagase, Ali Baratov, Joel Tacla Asubar, Hirokuni Tokuda, Masaaki Kuzuhara, Zenji Yatabe, Kenta Naito, Motoyama Tomohiro, Yusui Nakamura. GaN-based MIS-HEMTs with Mist Chemical Vapor Deposited Al2O3. IEICE technical report. Electron devices. 2020. 120. 254. 49-52
more...
Patents (1):
Lectures and oral presentations  (214):
  • Charge Relaxation Time Distribution of 1/<i>f</i> noise
    (The 71st JSAP Spring Meeting 2024)
  • Characterization of mist-Al<sub>2</sub>O<sub>3</sub>/n-GaN Structures Fabricated on Free-standing GaN Substrates
    (The 71st JSAP Spring Meeting 2024)
  • 次世代パワー・高周波デバイスの実現に向けたワイドギャップ半導体界面の評価と制御
    (2024年年会 2024)
  • Effect of interface states on capacitance-voltage characteristics of wide-bandgap MOS capacitors
    (SMDF 2023 2023)
  • ゲート絶縁膜堆積プロセスとデバイス評価技術の開拓
    (電子情報通信学会北海道支部講演会 2023)
more...
Education (4):
  • 2005 - 2008 Tokyo University of Agriculture and Technology United Graduate School of Agricultural Science Department of Biochemistry and Biotechnology
  • 2005 - 2006 École normale supérieure de Cachan (ENS Cachan) Laboratoire de Photophysique et Photochime Supramoléculaires et Macromoléculaire (PPSM)
  • 2003 - 2005 Tokyo University of Agriculture and Technology Graduate School of Agriculture Department of Natural Resources and Materials
  • 1999 - 2003 Tokyo University of Agriculture and Technology Faculty of Agriculture Department of Environmental and Natural Resource Science
Professional career (3):
  • Ph.D. in Biochemistry and Biotechnology (Tokyo University of Agriculture and Technology)
  • Master of Agriculture (Tokyo University of Agriculture and Technology)
  • Bachelor of Agriculture (Tokyo University of Agriculture and Technology)
Work history (6):
  • 2023 - 現在 Kumamoto University Research and Education Institute for Semiconductors and Informatics Associate Professor
  • 2020 - 2023 Kumamoto University Division of Informatics and Energy, Faculty of Advanced Science and Technology (FAST) Associate Professor
  • 2015 - 2020 Kumamoto University Priority Organization for Innovation and Excellence (POIE) Assistant Professor
  • 2015 - 2015 Hokkaido University Research Center for Integrated Quantum Electronics (RCIQE) Specially Appointed Assistant Professor
  • 2011 - 2015 Hokkaido University Research Center for Integrated Quantum Electronics (RCIQE) Postdoctoral Fellow
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Committee career (9):
  • 2024/04 - 現在 The Japan Society of Applied Physics (JSAP) Program Committee member (Compound and power devices, process technology and characterization)
  • 2023 - 現在 電気学会 電子・情報・システム部門(C部門) 電子デバイス技術委員会 化合物半導体を用いた次世代高機能デバイス技術とアプリケーション調査専門委員会 委員
  • 2020 - 現在 National Institute of Science and Technology Policy (NISTEP) The S&T Experts Network Investigator
  • 2023 - 2023 The Japan Society of Applied Physics Local Steering Committee, The 84th JSAP Autumn Meeting 2023
  • 2022 - 2022 第13回 半導体材料・デバイスフォーラム 実行委員
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Awards (1):
  • 2016/09 - The Japan Society of Applied Physics 38th JSAP Paper Award Characterization of electronic states at insulator/(Al)GaN interfaces for improved insulated gate and surface passivation structures of GaN-based transistors
Association Membership(s) (1):
The Japan Society of Applied Physics
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