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J-GLOBAL ID:201002037591752646   Reference number:76A0093726

Silicon nitride films by direct RF sputter deposition.

シリコン窒化物膜の直接rfスパッタ析出
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Volume: 122  Issue:Page: 1271-1273  Publication year: 1975 
JST Material Number: C0285A  ISSN: 0013-4651  CODEN: JESOA  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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