Art
J-GLOBAL ID：201002037591752646   Reference number：76A0093726

Silicon nitride films by direct RF sputter deposition.

シリコン窒化物膜の直接rfスパッタ析出
Author (1)：
KOMINIAK G J

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Material：
J Electrochem Soc  (Journal of the Electrochemical Society)

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Volume： 122  Issue： 9  Page： 1271-1273  Publication year： 1975 
JST Material Number： C0285A  ISSN： 0013-4651  CODEN： JESOA  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
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スパッタリング法

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,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
膜厚

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Terms in the title (3)：
Terms in the title
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シリコン窒化物膜

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, 
RFスパッタ

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, 
析出

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