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J-GLOBAL ID:201002075784366297   Reference number:78A0083491

Etching characteristics of various materials by plasma reactive sputter etching.

プラズマ反応性スパッタエッチングによる種々の材料のエッチング
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Volume: 17  Issue:Page: 235-236  Publication year: 1978 
JST Material Number: G0520A  CODEN: JJAPA  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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