Art

J-GLOBAL ID：201002223996461043   Reference number：10A0019439

Catalyst-Free Growth of Networked Nanographite on Si and SiO₂ Substrates by Photoemission-Assisted Plasma-Enhanced Chemical Vapor Deposition

光電子放出介助の化学蒸着によるSi及びSiO₂基板上のネットワーク化ナノグラファイトの触媒フリー成長

Author (16)： TAKAMI Tomohide (Core Res. for Evolutionary Sci. and Technol., Japan Sci. and Technol. Agency, JPN) ,  TAKAMI Tomohide (Inst. of Multidisciplinary Res. for Advanced Materials, Tohoku Univ., JPN) ,  OGAWA Shuichi (Core Res. for Evolutionary Sci. and Technol., Japan Sci. and Technol. Agency, JPN) ,  OGAWA Shuichi (Inst. of Multidisciplinary Res. for Advanced Materials, Tohoku Univ., JPN) ,  SUMI Haruki (Inst. of Multidisciplinary Res. for Advanced Materials, Tohoku Univ., JPN) ,  KAGA Toshiteru (Inst. of Multidisciplinary Res. for Advanced Materials, Tohoku Univ., JPN) ,  SAIKUBO Akihiko (Core Res. for Evolutionary Sci. and Technol., Japan Sci. and Technol. Agency, JPN) ,  SAIKUBO Akihiko (Japan Synchrotron Radiation Res. Inst., JPN) ,  IKENAGA Eiji (Core Res. for Evolutionary Sci. and Technol., Japan Sci. and Technol. Agency, JPN) ,  IKENAGA Eiji (Japan Synchrotron Radiation Res. Inst., JPN) ,  SATO Motonobu (Core Res. for Evolutionary Sci. and Technol., Japan Sci. and Technol. Agency, JPN) ,  SATO Motonobu (Fujitsu Ltd., JPN) ,  NIHEI Mizuhisa (Core Res. for Evolutionary Sci. and Technol., Japan Sci. and Technol. Agency, JPN) ,  NIHEI Mizuhisa (Fujitsu Ltd., JPN) ,  TAKAKUWA Yuji (Core Res. for Evolutionary Sci. and Technol., Japan Sci. and Technol. Agency, JPN) ,  TAKAKUWA Yuji (Inst. of Multidisciplinary Res. for Advanced Materials, Tohoku Univ., JPN)
Material： e-Journal of Surface Science and Nanotechnology (Web)  (表面科学とナノテクノロジー)
Volume： 7  Page： 882-890 (J-STAGE)  Publication year： 2009 
JST Material Number： U0016A  ISSN： 1348-0391  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *photoemission ,  nanostructure ,  network structure ,  *plasma CVD ,  photocurrent ,  *Graphite ,  silicon dioxide ,  substrate (plate) ,  *solid phase growth ,  gas-solid interface
Semi thesaurus term： *plasma-enhanced chemical vapor deposition

JST classification (4)： Carbon and its compounds  (YB02060D) ,  Inorganic compounds and elements in general  (CD01010D) ,  Thin films of other inorganic compounds  (BK14060A) ,  Solid-gos interface in general.  (CB12041H)

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Terms in the title (8)： 光電子放出 ,  介助 ,  化学蒸着 ,  Si ,  SiO2 ,  ナノグラファイト ,  触媒 ,  成長