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J-GLOBAL ID:201102204619739625   Reference number:11A0437885

High-density microwave plasma-enhanced chemical vapor deposition of microcrystalline silicon from dichlorosilane

Author (6):
Volume: 516  Issue: 19  Page: 6585-6591  Publication year: 2008
JST Material Number: O6387A  ISSN: 0040-6090  Document type: Article
Country of issue: Other (ZZZ)  Language: ENGLISH (EN)
Terms in the title (5):
Terms in the title
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