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J-GLOBAL ID:201102226918868117   Reference number:11A1393901

Process Performances of 2ns Pulsed Discharge Plasma

2nsパルス放電プラズマの処理性能
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Material:
Volume: 50  Issue: 8,Issue 2  Page: 08JF14.1-08JF14.5  Publication year: Aug. 25, 2011 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Applications of plasma  ,  Exhaust gas treatment 
Reference (24):
  • 1) Y. Kim, W. S. Kang, J. M. Park, S. H. Hong, Y. H. Song, and S. J. Kim: IEEE Trans. Plasma Sci. 32 (2004) 18.
  • 2) D. Bingyan, L. Jie, W. Yan, and L. Guofeng: Jpn. J. Appl. Phys. 44 (2005) 1959.
  • 3) S. Sawada, K. Kanesawa, S. Mukaigawa, K. Takaki, K. Fujiwara, and T. Sasaki: Denki Gakkai Ronbunshi A 127 (2007) 165 [in Japanese].
  • 4) S. Ueda, F. Tanaka, K. Kouno, M. Akiyama, T. Sakugawa, H. Akiyama, and Y. Kinoshita: Proc. IEEE Pulsed Power and Plasma Science Conf., 2007, p. 994.
  • 5) K. Takaki, I. Yagi, S. Mukaigawa, T. Fujiwara, and T. Go: Proc. IEEE Pulsed Power and Plasma Science Conf., 2007, p. 989.
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