Art
J-GLOBAL ID:201102258107085243   Reference number:11A1154112

Characteristics of SiH4/H2 VHF plasma produced by short gap discharge

短ギャップ放電で製造したSiH4/H2VHFプラズマの特性評価
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Material:
Volume: 205  Issue: Supplement 2  Page: S411-S414  Publication year: Jul. 25, 2011 
JST Material Number: D0205C  ISSN: 0257-8972  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Thin films of other inorganic compounds 
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