Rsrc
J-GLOBAL ID:201110001779916836   Research Resource code:1000001953 Update date:Oct. 22, 2004

Film stress measurement instrument

薄膜応力測定装置
Owning Organization:
Contact: KOZUKA Hiromitsu
Resource classification: Experience equipment, Facilities, etc
Research area  (2): Functional material chemistry ,  Inorganic material/physical properties
Overview:
Internal stress of films deposited on silicon
substrates can be measured at temperatures between
room temperature and 500°C.

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