Rsrc
J-GLOBAL ID:201110003796497777   Research Resource code:1000002015 Update date:Nov. 25, 2005

High Performance Molecular Beam Epitaxy system

高機能分子線エピタキシーシステム
Owning Organization:
Contact: TERAUCHI Hikaru
Resource classification: Experience equipment, Facilities, etc
Research area  (1): Physical properties I
Overview:
This system can perform dry-etching process at an
atomic level, in addetion to usual MBE growth.
User environment and conditions:
Not to disturb the Activities of Research and Education
User procedures and method:
If further information is necessary, please make
contact with the manager by masahi@kgo.kwansei.ac.jp

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