Rsrc
J-GLOBAL ID:201110009879464372   Research Resource code:1000000244 Update date:Jan. 26, 2005

反応型薄膜作製装置

反応型薄膜作製装置
Owning Organization:
Contact: SATO Yuichi, SAITO Hitoshi
Resource classification: Experience equipment, Facilities, etc
Research area  (1): Electronic device/electronic equipment
Overview:
Instrument for preparation of reactive thin films
Main purpose: Thin film fabrication of various
functional materials for development of microscopic
functional devices
(1) Thin film fabrication apparatus
(2) Laser irradiation apparatus
(3) Gas detection system
(4) Scanning laser microscope
(5) X-Ray Diffractometer
Research field : Electron Devices and Apparatus Engineering
User environment and conditions:
Only if our research is not affected.
User procedures and method:
Procedure of use: For a detailed information of use,
contact our Center.
Charge: 1000 yen/month
Necessary qualification for use: Coworkers of the
university.
Constraints on use:Nothing in particular.

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