J-GLOBAL ID:201110015249309174   Research Resource code:1000001107 Update date:Dec. 05, 2005


Owning Organization:
Contact: OKAMOTO Hisaki
Resource classification: Experience equipment, Facilities, etc
Research area  (4): Physical properties I ,  Applied physical properties/crystal engineering ,  Applied optics/quantum optical engineering ,  Electronic device/electronic equipment
Ultrathin film crystal manufacturing equipment:
This ultrathin film crystal manufacturing equipment is a
molecular beam epitaxial growth equipment with an
ultrahigh vacuum room for manufacturing thin films by
controlling with high precision the film thickness
composition and impurities within the layer of an
ultrathin film of inorganic compounds (minimum control
film of 2 nm).
User environment and conditions:
Required to coordinate the schedule for use with other users.
User procedures and method:
Procedure for use: For further information, contact the
person responsible.
Charge for use: Actual cost for utilities such as heating
and lighting to be covered by users
Qualification for use: Research collaborator with
Restriction on use: Required to have knowledge on use of

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