Rsrc
J-GLOBAL ID:201110029515173284   Research Resource code:5000002684 Update date:Dec. 13, 2005

SR micro lithography and etching for micro / nano fabrication

SMILE II(放射光)
Owning Organization:
Contact: SUGIYAMA Susumu
Resource classification: Experience equipment, Facilities, etc
Research area  (2): Structural/functional materials ,  Material processing/treatment
Overview:
High aspect ratio microparts for micromachines can be
fabricated using LIGA process which is combined X-ray
lithography, electroforming and molding. The X-ray
exposure is the most important step in the LIGA process.
Patterns designed on an-ray mask can be transferred into
an X-ray sensitive resist layer with a thickness of
several hundred mum to 1000mum by means of synchrotron
radiation.
User environment and conditions:
スポット利用 委託分析 受託研究 共同研究
事務局が担当教員との調整を行う。

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