Rsrc
J-GLOBAL ID:201110033171878809   Research Resource code:1000001887 Update date:Dec. 13, 2005

Exposure equipment for LIGA process

LIGA I(X線露光)(放射光)
Owning Organization:
Contact: SUGIYAMA Susumu
Resource classification: Experience equipment, Facilities, etc
Research area  (2): Structural/functional materials ,  Material processing/treatment
Overview:
High aspect ratio microparts for micronachines
can be fabricated using LIGA process which is
combined X-ray lithography, electroforming and
molding. The X-ray exposure is the most important
step in the LIGA process. Patterns designed on
an-ray mask can be transferred into an X-ray
sensitive resist layer with a thickness of several
hundred mum to 1000mum by means of synchrotron
radiation.
User environment and conditions:
学内の教育・研究に支障のないこと。
User procedures and method:
利用手続き:別紙あり
利用料金:有料
利用者の資格:企業利用可

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