Rsrc
J-GLOBAL ID:201110041342436144   Research Resource code:5000002724 Update date:Mar. 18, 2004

Ion Implanter (0.5 - 3 MeV) VdG accelerator with RBS and Channeling Analysis

イオン注入装置、VdG加速器
Owning Organization:
Contact: Hayashi Nobuyuki
Resource classification: Experience equipment, Facilities, etc
Overview:
Ion Implantation
Ion Beam Analysis
User environment and conditions:
Contract analysis
User procedures and method:
Application procedure by telephone or by writing.


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