Rsrc
J-GLOBAL ID:201110050917352451   Research Resource code:5000002612 Update date:Dec. 24, 2004

Multi-ion beams generation source

多種イオン発生装置EFIB-2000S
Owning Organization:
Contact: ISHIKAWA Junzo
Resource classification: Experience equipment, Facilities, etc
Research area  (1): Thin film and surface interface physical properties
Overview:
Multi-ion beams generation source: Experimental equipment
in which various kinds of positive and negative ions are
generated and low energy ion beams are irradiated on or
implanted into solid surfaces
Research field : Applied physics, Basic Engineering
User environment and conditions:
It is necessary thet there is no obstacle for the research and education activity in the research laboratory of high intensity ion sources.
User procedures and method:
The person who has obtained the qualification of
cooperating researcher for the university, can use this
facility.

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