Rsrc
J-GLOBAL ID:201110071150426931   Research Resource code:1000001895 Update date:Dec. 13, 2005

Exposure equipment for LIGA process

LIGAII(X線露光)(放射光)
Owning Organization:
Contact: SUGIYAMA Susumu
Resource classification: Experience equipment, Facilities, etc
Research area  (1): Structural/functional materials
Overview:
High aspect ratio microparts for micromachines
can be fabricated using LIGA process which is
combined X-ray lithography, electroforming and
molding. The X-ray exposure is the most important
step in the LIGA process. Patterns designed on an
X-ray mask can be transferred into an X-ray
sensitive resist layer with a thickness of
several hundred mu m to 1000 mu m by means of
synchrotron radiation.
User environment and conditions:
研究業務の遂行に支障のないこと
User procedures and method:
1-1-1 Noji Higashi, Kusatsu-shi, Shiga 525-8577
Japan
+81-77-561-2631
+81-77-561-2633

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