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J-GLOBAL ID:201202204609281199   Reference number:12A1327956

A narrow process window for the preparation of polytypes of microcrystalline silicon carbide thin films by hot-wire CVD method

ホット-ワイヤCVD法により重合型微結晶炭化シリコン薄膜を製作するための狭いプロセスウィンドウ
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Material:
Volume: 358  Issue: 17  Page: 1987-1989  Publication year: Sep. 01, 2012 
JST Material Number: D0642A  ISSN: 0022-3093  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Semiconductor thin films  ,  Solar cell  ,  Inorganic compounds and elements in general 
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