Art

J-GLOBAL ID：201202220160531255   Reference number：12A1253606

Evaluation of zinc self-diffusion at the interface between homoepitaxial ZnO thin films and (0001) ZnO substrates

ホモエピタキシャルZnO薄膜と(0001)ZnO基板との間の界面における亜鉛の自己拡散の評価

Author (11)： WATANABE Ken (National Inst. for Materials Sci., 1-1 Namiki, Tsukuba, Ibaraki 305-0044, JPN) ,  MATSUMOTO Kenji (National Inst. for Materials Sci., 1-1 Namiki, Tsukuba, Ibaraki 305-0044, JPN) ,  ADACHI Yutaka (National Inst. for Materials Sci., 1-1 Namiki, Tsukuba, Ibaraki 305-0044, JPN) ,  OHGAKI Takeshi (National Inst. for Materials Sci., 1-1 Namiki, Tsukuba, Ibaraki 305-0044, JPN) ,  NAKAGAWA Tsubasa (National Inst. for Materials Sci., 1-1 Namiki, Tsukuba, Ibaraki 305-0044, JPN) ,  OHASHI Naoki (National Inst. for Materials Sci., 1-1 Namiki, Tsukuba, Ibaraki 305-0044, JPN) ,  OHASHI Naoki (Kyushu Univ., 6-1 Kasuga-kouen, Kasuga, Fukuoka 816-8580, JPN) ,  HANEDA Hajime (National Inst. for Materials Sci., 1-1 Namiki, Tsukuba, Ibaraki 305-0044, JPN) ,  HANEDA Hajime (Kyushu Univ., 6-1 Kasuga-kouen, Kasuga, Fukuoka 816-8580, JPN) ,  SAKAGUCHI Isao (National Inst. for Materials Sci., 1-1 Namiki, Tsukuba, Ibaraki 305-0044, JPN) ,  SAKAGUCHI Isao (Kyushu Univ., 6-1 Kasuga-kouen, Kasuga, Fukuoka 816-8580, JPN)
Material： Solid State Communications  (Solid State Commun)
Volume： 152  Issue： 20  Page： 1917-1920  Publication year： Oct. 2012 
JST Material Number： H0499A  ISSN： 0038-1098  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Thesaurus term： homoepitaxy ,  *zinc ,  *diffusion in solid ,  *zinc oxide ,  compound semiconductor ,  semiconductor thin film ,  zinc isotope ,  secondary ion mass spectrometry ,  diffusion coefficient ,  activation energy ,  annealing(heat treatment) ,  vacancy ,  self-diffusion

JST classification (1)： Diffusion in solids in general  (BL06021L)

Terms in the title (8)： ホモ ,  エピタキシャル ,  ZnO薄膜 ,  ZnO ,  界面 ,  亜鉛 ,  自己拡散 ,  評価